Tan, Zoilo C. H. : rechercher sur Z-Library

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1

Evaluation of DNQ/novolac resists for 130 nm device maskmaking

Zoilo C.H. Tan, Phuong Le, Homer Lem

Journal:

Microelectronic Engineering

Année:

1998

Langue:

english

Fichier:

PDF, 350 KB

english, 1998

2

Potential of DNQ/novolac and chemically amplified resists for 100 nm device generation maskmaking

Zoilo C.H Tan, Phuong Le, Tom Coleman

Journal:

Microelectronic Engineering

Année:

2001

Langue:

english

Fichier:

PDF, 357 KB

english, 2001

3

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography

Tegou, Evangelia, Gogolides, Evangelos, Argitis, Panagiotis, Raptis, Ioannis, Patsis, George P., Glezos, Nikos, Tan, Zoilo C. H., Lee, Kim Y., Le, Phuong T., Hsu, Yautzong, Hatzakis, Michael, Houlihan

Année:

2000

Langue:

english

Fichier:

PDF, 709 KB

english, 2000

4

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Process optimization of a positive-tone chemically amplified resist for 0.25-um lithography using a vector scan e-beam tool

Katnani, Ahmad D., Schepis, Dominic, Kwong, Ranee W., Huang, Wu-Song, Tan, Zoilo C. H., Sauer, Charles A., Allen, Robert D.

Année:

1995

Langue:

english

Fichier:

PDF, 862 KB

english, 1995

5

Evaluation of poly(allyl methacrylate)-co-(hydroxyethyl methacrylate) as negative electron-beam resist

Zoilo C. H. Tan, Sharon S. Georgia

Journal:

Polymer Engineering & Science

Année:

1983

Langue:

english

Fichier:

PDF, 489 KB

english, 1983

6

SPIE Proceedings [SPIE 14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA (Wednesday 14 September 1994)] 14th Annual BACUS Symposium on Photomask Technology and Management - Application of charge-dissipation material in MEBES phase-shift mask fabrication

Tan, Zoilo C. H., Sauer, Charles A., Brodsky, William L., Shelden, Gilbert V.

Année:

1994

Langue:

english

Fichier:

PDF, 471 KB

english, 1994

7

Extraction of some anions from molten lithium nitrate-potassium nitrate by tetraoctylphosphonium nitrate in polyphenyl or 1-nitronaphthalene solvent

Tan, Zoilo C. H., Irvine, J. W.

Journal:

Inorganic Chemistry

Année:

1972

Langue:

english

Fichier:

PDF, 827 KB

english, 1972

8

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX - E-beam direct write of rectangular and mushroom gates for GaAs FETs

Tan, Zoilo C. H., Silverman, Scott E., Resnick, Douglas J.

Année:

1990

Langue:

english

Fichier:

PDF, 1.02 MB

english, 1990

9

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - 0.25-μm lithography using a 50-kV shaped electron-beam vector scan system

Gesley, Mark A., Mulera, Terry, Nurmi, C., Radley, J., Sagle, Allan L., Standiford, Keith P., Tan, Zoilo C. H., Thomas, John R., Veneklasen, Lee, Warlaumont, John M.

Année:

1995

Langue:

english

Fichier:

PDF, 849 KB

english, 1995

10

SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Evaluation of commercial and experimental resist materials for use in MEBES mask making

Sauer, Charles A., Dean, Robert L., Morita, Etsuya, Tan, Zoilo C. H., Smith, Bruce W., Ewbank, Dale E., Duttagupta, Sid P., Rudack, Anne, Shelden, Gilbert V., Wiley, James N.

Année:

1995

Langue:

english

Fichier:

PDF, 383 KB

english, 1995

11

ChemInform Abstract: EXTRAKTION EINIGER ANIONEN AUS EINER LITHIUMNITRAT-KALIUMNITRAT-SCHMELZE DURCH TETRAOCTYLPHOSPHONIUMNITRAT IM POLYPHENYL- ODER 1-NITRONAPHTHALIN-LOESUNGSMITTEL

TAN, ZOILO C. H., IRVINE, J. W. JUN.

Journal:

Chemischer Informationsdienst

Année:

1972

Fichier:

PDF, 143 KB

1972